< Semiconductor Sec.
HMDSO acts as a silylating agent and intermediate for synthesizing active pharmaceutical ingredients (APIs). In the semiconductor sector, it is employed in plasma-enhanced chemical vapor deposition (PECVD) to create protective silicon dioxide (SiO₂) layers on microchips. Additionally, HMDSO is used in water-repellent coatings and lubricants, enhancing durability and performance.
Hexamethyldisiloxane (HMDSO) is a clear, volatile, and hydrophobic liquid with the chemical formula [(CH₃)₃Si]₂O. It is widely used in pharmaceuticals, semiconductors, and coatings due to its unique siloxane bond (Si-O-Si), which provides thermal stability and low surface tension.
Coatings and Surface Treatment: Acts as a hydrophobic agent in coatings, enhancing water and oil repellency for textiles, glass, and ceramics.
Cosmetics: Utilized as a silicone-based solvent and emollient in products like hair sprays, conditioners, and skin care items for a smooth finish.
| Parameters | Specification |
|---|---|
| Specific gravity(@ 25°C) | NMT 0.764 |
| Boiling Range | 101°C to 102 °C |
| Purity as HMDO (by GC) | NLT 99.00 % |
| Density | 0.76 g/cm (Cube) |
| Refractive index | Approx 1.375 |
| Surface tension | 0.0192 N/m |
| Viscosity | 0.69678 mm(Sq)/s |
| Auto-ignition Temp. | 326 Deg C |